Proceedings of the Korean Nuclear Society Conference (한국원자력학회:학술대회논문집)
- 1996.11b
- /
- Pages.506-511
- /
- 1996
$UO_2$ Etching by Fluorine Containing Gas Plasma
- Min, Jin-Young (Nuclear engineering department, Hanyang university) ;
- Kim, Yong-Soo (Nuclear engineering department, Hanyang university) ;
- Bae, Ki-Kwang (Korea Atomic Energy Research Institute) ;
- Yang, Myung-Seung (Korea Atomic Energy Research Institute) ;
- Lee, Jae-Sul (Korea Atomic Energy Research Institute) ;
- Park, Hyun-Soo (Korea Atomic Energy Research Institute)
- Published : 1996.11.01
Abstract
Research on the dry etching of UO
Keywords