한국재료학회:학술대회논문집 (Proceedings of the Materials Research Society of Korea Conference)
- 한국재료학회 1996년도 재료학회 추계학술발표회
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- Pages.47-48
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- 1996
Effect of Post Plasma Treatment on Water Absorption and Dielectric Properties of Fluorine Doped $SiO_2$ Films Formed by ECRCVD with $SiF_4$ and $O_2$
- Yoo, Jae-Yoon (Department of Metallurgical Engineering, Hanyang University) ;
- Lee, Seonghyeong (Department of Metallurgical Engineering, Hanyang University) ;
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Park, Jong-Wan
(Department of Metallurgical Engineering, Hanyang University)
- 발행 : 1996.11.01