한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 1996년도 추계학술대회 논문집
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- Pages.386-388
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- 1996
ECR CVD 방법에 의해 증착된 저유전율 SiOF 박막특성
Propcrties of Low Delectric Constant SiOF Films Formed by ECR CVD
초록
Low dielectric constant fluorinated oxide (SiOF) films were deposited using SiF
키워드