한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 1996년도 추계학술대회 논문집
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- Pages.334-337
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- 1996
수용성 TMAH/IPA 용액의 실리콘 이방성 식각
Anisotropic Etching of Silicon in Aqueous TMAH/IPA Solutions
초록
Si anisotropic etching is a key technology for micromachining. The main advantages of tetramethyl ammonium hydroxide (TMAH)-based solution are their full compatibility with IC process. In this work the anisotropic etching of single crystal Si in a TMAH ((