한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 1996년도 추계학술대회 논문집
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- Pages.252-255
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- 1996
반응성 이온 식각후 AlCu막의 부식현상
The corrosion phenomena of AlCu films after reactive ion etching
초록
Cl-based gas chemistry is generally used to etching for Al alloy metallization. After the etching of Al alloy with Cl-based gas plasma, residual chlorine on Al alloy reacts with
키워드