Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A study on the structural properties of BaTiO$_3$thin films with sputtering condition

sputtering 조건에 따른 BaTiO$_3$박막의 구조적 특성에 관한 연구

  • 이문기 (광운대학교 전자재료공학과) ;
  • 류기원 (여주전문대학 전자과) ;
  • 배선기 (인천대학교 전기공학과) ;
  • 이영희 (광운대학교 전자재료공학과)
  • Published : 1996.11.01
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Abstract

BaTiO$_3$thin films were deposited on Pt/SiO$_2$/Si substrates by RF sputtering technique. The structural and crystallographic properties were studied with deposition conditions and annealing temperatures. Deposition rates and structural properties of BaTiO$_3$thin films were investigated by the SEM, XRD and AFM. The thickness of BaTiO$_3$thin films deposited with optimized conditions was 5200[$\AA$]. The grain size was found to increase remarkably with increasing sputtering power and independent on the sputtering pressure.

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