Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1996.02a
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- Pages.158-158
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- 1996
Study on the Residue Film Induced by Magnetically-Enhanced Reactive Ion Etching of Al(Si,Cu) Film Using the Mixture of $BCl_3,Cl_2 and N_2$ Gases
- Yun, Sun-Jin (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
- Kwon, Kwang-Ho (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
- Kim, Chang-Il (Department of Electrical Engineering, Hanseo University) ;
- Lee, Joong-Whan (Department of Electronic Engineering, Anyang University) ;
- Nam, Kee-Soo (Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
- Published : 1996.02.01
Abstract
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