제어로봇시스템학회:학술대회논문집
- 제어로봇시스템학회 1996년도 한국자동제어학술회의논문집(국내학술편); 포항공과대학교, 포항; 24-26 Oct. 1996
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- Pages.415-418
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- 1996
플라즈마 식각공정에서의 EPD(End Point Detection) 제어기에 관한 연구
A study on EPD(End Point Detection) controller on plasma teaching process
초록
Etching Process, one of the most important process in semiconductor fabrication, has input control part of which components are pressure, gas flow, RF power and etc., and plasma gas which is complex and not exactly understood is used to etch wafer in etching chamber. So this process has not real-time feedback controller based on input-output relation, then it uses EPD(End Point Detection) signal to determine when to start or when to stop etching. Various type EPD controller control etching process using EPD signal obtained from optical intensity of etching chamber. In development EPD controller we concentrate on compensation of this signal intensity and setting the relative signal magnitude at first of etching. We compensate signal intensity using neural network learning method and set the relative signal magnitude using fuzzy inference method. Potential of this method which improves EPD system capability is proved by experiences.