SOG 희생층을 이용한 마이크로 구조의 형성

Fabrication of Micro-structure using SOG as a Sacrificial Layer

  • 신경식 (서울시립대학교 전자공학과) ;
  • 이성준 (서울시립대학교 전자공학과) ;
  • 김정구 (서울시립대학교 전자공학과) ;
  • 최연화 (서울시립대학교 전자공학과) ;
  • 김철주 (서울시립대학교 전자공학과)
  • Shin, Kyeong-Sik (Dept. of Electronic Engineering, Graduate School of Seoul City University) ;
  • Lee, Sung-Jun (Dept. of Electronic Engineering, Graduate School of Seoul City University) ;
  • Kim, Jeong-Goo (Dept. of Electronic Engineering, Graduate School of Seoul City University) ;
  • Choi, Yeon-Hwa (Dept. of Electronic Engineering, Graduate School of Seoul City University) ;
  • Kim, Chul-Ju (Dept. of Electronic Engineering, Graduate School of Seoul City University)
  • 발행 : 1996.07.22

초록

In this study, Allied Signal 211 SOG was used as a sacrificial material. After researching its etching properties, we adapted it to bottom-drive micrometers. SOG was superior etch rate and roughness to them of PSG or CVD-oxide and possible to low-temperature processing. Etching properties of SOG depended on the temperature and duration of its bake and cure. SOG used in the fabrication of bottom-drive micrometers showed us usefulness as a sacrificial layer and haying a least influence on machines on it in comparison with conventional sacrificial materials.

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