Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1996.07c
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- Pages.1440-1442
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- 1996
Characteristics Of XeCl Excimer-Laser Annealed Insulator
XeCl EXCIMER-LASER 이용하여 열처리된 절연막의 특성 분석
- Park, C.M. (School of Electrical Engineering, Seoul National University) ;
- Yoo, J.S. (School of Electrical Engineering, Seoul National University) ;
- Choi, H.S. (School of Electrical Engineering, Seoul National University) ;
- Han, M.K. (School of Electrical Engineering, Seoul National University)
- 박철민 (서울 대학교 공과대학 전기공학부) ;
- 유준석 (서울 대학교 공과대학 전기공학부) ;
- 최홍석 (서울 대학교 공과대학 전기공학부) ;
- 한민구 (서울 대학교 공과대학 전기공학부)
- Published : 1996.07.22
Abstract
The laser annealing effects on the TEOS (Tetra-Ethyl-Ortho-Silicate) oxide of MOS (Al/TEOS/n+ Silicon) structures was investigated with different initial oxide conditions, such as breakdown field. The breakdown field increased up to the 170
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