Effects of TCA Incorporation During Annealing Process on The Propperties of Oxygen Ion Implanted Silicon Wafers

  • Bae, Y.H (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
  • Kwon, Y.K (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
  • Kim, K.I (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
  • Chung, W.J. (Electronic device & system research Lab. Research Institute of Industrial Science & Technology)
  • Published : 1995.06.01