Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)

The Korean Vacuum Society (한국진공학회)
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Comparison of $Si/SiO_2$ Interface Formed by Remote Plasma Enhanced Chemical Vapor Deposition and Thermal Oxidation

  • Park, Young-Bae (Laboratory for Advanced Materials Processing) ;
  • XialdongLi (Department of Metals and TEchnology, Harbin Institute of Technology) ;
  • Rhee, Shi-Woo (Laboratory for Advanced Materials Processing)
  • Published : 1995.06.01
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