Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Measurement of Hydrogen Atoms in a Processing Plasma using Laser Induced Fluorescence

레이저 형광법에 의한 프로세싱 플라즈마 중의 수소원자 계측

  • Park, Won-Joo (Department of Electrical Engineering Yeungnam University) ;
  • Park, Sung-Gun (Department of Electrical Engineering Yeungnam University) ;
  • Lee, Kwang-Sik (Department of Electrical Engineering Yeungnam University) ;
  • Lee, Dong-In (Department of Electrical Engineering Yeungnam University)
  • 박원주 (영남대학교 전기공학과) ;
  • 박성근 (영남대학교 전기공학과) ;
  • 이광식 (영남대학교 전기공학과) ;
  • 이동인 (영남대학교 전기공학과)
  • Published : 1995.07.20
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Abstract

During measurement of atomic hydrogen in a silane plasma using two-photon excited laser induced fluoresecence, laser-induced dissociation of the gas was observed. This was investigated untill conditions for the input laser fluence were determined where the effect was negligible. A measurement of the atomic hydrogen distribution was then performed within the limits of these conditions. Absolute density determinations showed atomic hydrogen densities of around $3{\times}10^{17}m^{-3}$.

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