Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1995.07c
- /
- Pages.1098-1101
- /
- 1995
Effects of Sputtering pressure on preferred Orientation of Shielding NbTi Thin Film by RF Magnetron Sputtering
RF 마그네트론 스퍼터링법으로 제조된 차폐용 NbTi박막의 우선방향에 미치는 스퍼터링 압력의 영향
-
Kim, Bong-Seo
(Korea Electrotechnology Research Institute) ;
-
Woo, Byung-Chul
(Korea Electrotechnology Research Institute) ;
-
Byun, Woo-Bong
(Korea Electrotechnology Research Institute) ;
-
Lee, Hee-Woong
(Korea Electrotechnology Research Institute)
- Published : 1995.07.20
Abstract
NbTi thin films were prepared on Si wafer and Cu substrate by rf magnetron sputtering in the range of sputtering pressure
Keywords