Characterials of Diamond Thin Film under MppECVD system

  • Kim, S.H. (New Materials Lab., Samsung Advanced Institute of Technology) ;
  • Park, Y.S. (New Materials Lab., Samsung Advanced Institute of Technology) ;
  • Jung, S.K. (New Materials Lab., Samsung Advanced Institute of Technology) ;
  • Lee, J.W. (New Materials Lab., Samsung Advanced Institute of Technology)
  • Published : 1994.06.01

Abstract

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