The fabrication of Laser CVD $Ta_2O_5$ and its characteristics

Laser CVD에 의한 $Ta_2O_5$ 형성과 그 특성

  • Hong, S.H. (Dept. of Electrical Eng. Korea University) ;
  • Ryoo, J.H. (Dept. of Electrical Eng. Korea University) ;
  • Yang, J.W. (Dept. of Electrical Eng. Korea University) ;
  • Kim, J.K. (Dept. of Electrical Eng. Korea University) ;
  • Huh, Y.J. (Dept. of Electrical Eng. Korea University) ;
  • Sung, Y.K. (Dept. of Electrical Eng. Korea University)
  • 홍성훈 (고려대학교 전기공학과) ;
  • 류지호 (고려대학교 전기공학과) ;
  • 양지운 (고려대학교 전기공학과) ;
  • 김종관 (고려대학교 전기공학과) ;
  • 허윤종 (고려대학교 전기공학과) ;
  • 성영권 (고려대학교 전기공학과)
  • Published : 1994.07.21

Abstract

This paper propose a new $Ta_2O_5$ film fabrication technique by Laser CVD. Laser CVD is noticable that film formation can be done at low temperature with less damage. After film deposition, the characteristics of Laser CVD $Ta_2O_5$ film is evaluated.

Keywords