한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1993년도 제4회 학술발표회 논문개요집
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- Pages.109-109
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- 1993
Effects of Cl$_2$ or SF$_6$ pplasma treatments on removal of residue on reactive ion etched Si surface
- ppark, Hyung-Ho (Semiconductor Technology Division, ETRI) ;
- Kwon, Kwang-Ho (Semiconductor Technology Division, ETRI) ;
- Koak, Byong-Hwa (Semiconductor Technology Division, ETRI) ;
- Kwon, Oh-Joon (Semiconductor Technology Division, ETRI)
- 발행 : 1993.02.01