대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

광기록을 위한 Te-based Antireflection구조의 열적, 광학적 특성

The Thermal and Optical Properties of Te-based Antireflection structure for Optical Recording

  • 이성준 (광운대학교 전자재료공학과) ;
  • 이현용 (광운대학교 전자재료공학과) ;
  • 정홍배 (광운대학교 전자재료공학과) ;
  • 이영종 (여주공업전문대학 전자공학과)
  • Lee, S.J. (Dept. of Electronic materials Eng. Kwangwoon Univ.) ;
  • Lee, H.Y. (Dept. of Electronic materials Eng. Kwangwoon Univ.) ;
  • Chung, H.J. (Dept. of Electronic materials Eng. Kwangwoon Univ.) ;
  • Lee, Y.J. (Dept. of Electronic Eng. Yeojoo Technical College)
  • 발행 : 1993.07.18
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Optical data storage offer high density storage and archival storage capability. In this study, we selected the ablation mechanism-one of an irreversible recording system-using the antireflection trilayer(ART) structure. Optical recording medium is a $(Te_{86}Se_{14})_{50}Bi_{50}$ thin films. Actually, ART structure is fabricated and compared to monolayer structure. ART structure leads to the reduction of recording power as well as an increase in the effciency compared to the monolayer structure.

키워드