Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1992.05a
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- Pages.32-32
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- 1992
A study on the reactive ion etching properties of aluminum oxide thin films by plasma enhanced chemical vapour deposition
플라즈마 화학증착한 aluminum oxide의 reactive ion etching 특성
Abstract
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