Ferromagnetism of thin films deposited from paramagnetic stainless steel targets by Facing Targets Sputtering

  • Matsushita, N. (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
  • Ono, N. (Dept. of Physical Electronics, Tokyo Institute of Technology) ;
  • Naoe, M. (Dept. of Physical Electronics, Tokyo Institute of Technology)
  • 발행 : 1991.05.01

초록

The films with ferromagnetic fine particles dispersed in nonmagnetic matrix, such as $Fe-Al_2O_3$ and Fe-Cu have been studied for use of magnetic recording medium, optically device and sensor. Their magnetic properties depend strongly on structural parameter such as size and volume fraction of ferromagnetic particles. Fe-Cr-Ni alloy sputtered films also have microstructure with ferromagnetic -- b.c.c phase and nonmagnetic f.c.c phase grains. Magnetic properties of these films depend strongly on such a unique structure. These are depend on the ratio in volume of ferromagnetic particles to nonmagnetic ones $V_F/V_N$, the saturation magnetization Ms increased with increase of $V_F/V_N$. The coercivity Hc of the as-deposited films took maximum value of about 200 Oe at adequate $V_F/V_N$ and then Ms and Squareness S were 500 emu/cc and 0.5, respectively.(omitted)

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