Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1991.07a
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- Pages.191-193
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- 1991
The eletrical conduction and breakdown characteristics of thin films by Laser CVD
Laser CVD절연막의 전기전도와 절연파괴특성
- Kang, H.B. (Dept. of Electrical Eng. Korea Univ.) ;
- Kwon, B.J. (Dept. of Electrical Eng. Korea Univ.) ;
- Kim, Y.W. (Dept. of Electrical Eng. Korea Univ.) ;
- Kim, S.J. (Dept. of Electrical Eng. Korea Univ.) ;
- Sung, Y.K. (Dept. of Electrical Eng. Korea Univ.)
- Published : 1991.07.18
Abstract
In this paper, we introduce silicon dioxide films deposited by Laser CVD, and evaluate the breakdown characteristics of these films by TZDB(Time Zero Dieiectric Breakdown) and TDDB(Time Dependent Dielectric Breakdown) test, failure times against eletric field are examined and accelation factors
Keywords