Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1991.07a
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- Pages.155-157
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- 1991
Step Coverage of Laser CVD Deposited $SiO_2$ Films
Laser CVD $SiO_2$ 막의 Step Coverage에 관한 연구
- Park, J.W. (Dept. of Electrical Eng., Korea Univ.) ;
- Kim, S.W. (Dept. of Electrical Eng., Korea Univ.) ;
- Chun, Y.I. (Dept. of Electrical Eng., Korea Univ.) ;
- Park, J.S. (Dept. of Electrical Eng., Korea Univ.) ;
- Kang, H.B. (Dept. of Electrical Eng., Korea Univ.) ;
- Sung, Y.K. (Dept. of Electrical Eng., Korea Univ.)
- 박종욱 (고려대학교 전기공학과) ;
- 김상욱 (고려대학교 전기공학과) ;
- 천영일 (고려대학교 전기공학과) ;
- 박지순 (고려대학교 전기공학과) ;
- 강희복 (고려대학교 전기공학과) ;
- 성영권 (고려대학교 전기공학과)
- Published : 1991.07.18
Abstract
This paper describe a Laser CVD technology which realizes planarized interlevel dielectrics in sub-micron VLSI's. This technology comprises sub-micron gap filling with
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