Fabrication of buried $Si_3N_4-SiO_2$ rib waveguide Bragg reflectors on Si and calculation of effective reflective indices

Si 기판 $Si_3N_4-SiO_2$ rib형 광도파로의 매립형

Buried Bragg reflectors which are immune to the contamination of the surface of an optical waveguide chip are fabricated on Si3N4-SiO2 rib optical waveguides on Si. The effective refractive indices and the bandwidths of the fabricated buried Bragg reflector waveguides are determined by transmission measurement. We show that the measured values of the effective refractive indices are consistent with the calculated values as the width of the waveguide rib varies. Propagation losses of the guided modes due to the leakage into the si substrate are also calculated.