Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1989.07a
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- Pages.335-337
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- 1989
TiN films by the HCD Ion plating
HCD법 이온플레이팅에 의한 TiN 박막제작
Abstract
The Charcteristics of the HCD ion plating system for TiN coating was Investigated. 1-V curvet of the HCD ( hollow cathode discharge ), radiation temperatures of the Ta tube and the Ti pool and the electron density and the temperature of the generated plasma are shown. The preferred orientation and the micro-hardness of coatings performed by HCD process are studied.
Keywords