Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A Study on the variation of thickness in $80^{\circ}$ Deposited a-Ge$Ge_{25}Se_{75}$ films

$80^{\circ}$로 증착된 비정질 $Ge_{25}Se_{75}$ 박막의 두께변화에 관한 연구

  • 엄정호 (광운대학교 전자재료공학과) ;
  • 김태완 (광운대학교 전자재료공학과) ;
  • 정홍배 (광운대학교 전자재료공학과)
  • Published : 1988.10.01
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Abstract

In the present study, we have investigated a novel photothermal imaging technique in $80^{\circ}$ deposited Ge Se film which do not utilize silver and deposited a-$Ge_{25}Se_{75}$ films was measured with the exposure time and annealing time. The results showed that the maximum changing rate of thickness was 3% in exposured film and 14% in postexposure annealing film.

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