스핀도포법으로 제조한 규소 태양 전지의 티타늄 산화물 반사 방지막

Titanium Dioxide Antireflection coating for Silicon Solar Cell by Spin Deposition

Titanium dioxide antireflection (AR) Coating, which is deposited on Si substrates using an organotitanium solution by the spinning technique, has been studied. The coated films on Si substrates were subsequently heated to $450^{\circ}C$. The thickness and index of refraction of films were varied continuousely from $740{\AA}$ to $1380{\AA}$ and from 1.7 to 2.1 respectively as a function of heat treatment temperature and time. Silicon solar cells AR-coated by the spinning technique showed as much as 31% improvement in conversion efficiency over the uncoated cell.