Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Fabrication and characteristics of PbO photoconductive layer

PbO 광도전막의 제작 및 그 특성

  • 김범규 (경북대학교 전자공학과) ;
  • 박기철 (경북대학교 전자공학과) ;
  • 최규만 (경북대학교 전자공학과) ;
  • 박창배 (경북대학교 전자공학과) ;
  • 김기완 (경북대학교 전자공학과)
  • Published : 1987.07.03
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Abstract

The structure of vacuum evaporated PbO films is investigated. Also, the Photosensitivity and dark resistivity are measured. The dominant structure and orientation of these films were red (tetragonal) form, and <110> and <101> direction under- the suitable deposition conditions. And the crystallite size of them was about $2um{\times}0.2um$. These PbO films have good photosensitivity(r=0.9) and high dark resistivity. (${\rho}=10^{14}{\Omega}{\cdot}cm$)

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