Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1987.07a
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- Pages.424-428
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- 1987
$2{\mu}m$ CMOS P-WELL DOUBLE METAL TECHNOLOGY
- Shin, C.H. (R & D CENTER, SAMSUNG Semiconductor & Telecommunication Co. Ltd.) ;
- Ahn, K.H. (R & D CENTER, SAMSUNG Semiconductor & Telecommunication Co. Ltd.) ;
- Jung, E.S. (R & D CENTER, SAMSUNG Semiconductor & Telecommunication Co. Ltd.) ;
- Jin, J.H. (R & D CENTER, SAMSUNG Semiconductor & Telecommunication Co. Ltd.)
- Published : 1987.07.03
Abstract
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